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US Patent Issued to Applied Materials on June 23 for "Modular high-frequency source" (California Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,665,169, issued on June 23, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Modular high-frequency source" was invented by Thai ... Read More


US Patent Issued to SEMES on June 23 for "Substrate treating apparatus and substrate treating method" (South Korean Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,665,170, issued on June 23, was assigned to SEMES Co. LTD. (Chungcheongnam-do, South Korea). "Substrate treating apparatus and substrate treati... Read More


US Patent Issued to ASM IP Holding on June 23 for "Method and system for selectively removing material at an edge of a substrate" (Japanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,665,171, issued on June 23, was assigned to ASM IP Holding B.V. (Almere, Netherlands). "Method and system for selectively removing material at ... Read More


US Patent Issued to APPLIED MATERIALS on June 23 for "Gas cooled high power connection rod" (Indian, American Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,665,172, issued on June 23, was assigned to APPLIED MATERIALS Inc. (Santa Clara, Calif.). "Gas cooled high power connection rod" was invented b... Read More


US Patent Issued to NGK INSULATORS on June 23 for "Wafer placement table" (Japanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,665,174, issued on June 23, was assigned to NGK INSULATORS Ltd. (Nagoya, Japan). "Wafer placement table" was invented by Seiya Inoue (Handa-Cit... Read More


US Patent Issued to Kioxia on June 23 for "Plasma processing apparatus and manufacturing method of semiconductor device" (Japanese Inventor)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,665,175, issued on June 23, was assigned to Kioxia Corp. (Tokyo). "Plasma processing apparatus and manufacturing method of semiconductor device... Read More


US Patent Issued to Tokyo Electron on June 23 for "Etching processing apparatus, etching processing system, analysis apparatus, etching processing method, and storage medium" (Japanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,665,176, issued on June 23, was assigned to Tokyo Electron Ltd. (Tokyo). "Etching processing apparatus, etching processing system, analysis app... Read More


US Patent Issued to ASML Netherlands on June 23 for "Vibration damping and resonance reduction for ion pump" (Dutch, American Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,665,177, issued on June 23, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands). "Vibration damping and resonance reduction for ion ... Read More


US Patent Issued to DH Technologies Development on June 23 for "Systems and methods for multistage mass spectrometry utilizing an electrostatic ion trap" (Canadian Inventor)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,665,178, issued on June 23, was assigned to DH Technologies Development Pte. Ltd. (Singapore). "Systems and methods for multistage mass spectro... Read More


US Patent Issued to DH Technologies Development on June 23 for "Systems and methods for fourier transform electrostatic ion trap with microchannel plate detector" (Canadian Inventor)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,665,179, issued on June 23, was assigned to DH Technologies Development Pte. Ltd. (Singapore). "Systems and methods for fourier transform elect... Read More